Okwangoku, i-DB-FIB (i-Dual Beam Focused Ion Beam) isetyenziswa ngokubanzi kuphando kunye nokuhlolwa kwemveliso kuwo wonke amasimi anje:
Izinto zeCeramic,Iipolymers,Izixhobo zentsimbi,Izifundo zebhayoloji,IiSemiconductors,Ijoloji
Imathiriyeli yeSemiconductor, imathiriyeli encinci ephilayo yemolekyuli, imathiriyeli yepolymer, imathiriyeli ye-organic/inorganic hybrid, imathiriyeli engeyiyo eyentsimbi.
Ngokuqhubela phambili ngokukhawuleza kwe-elektroniki ye-semiconductor kunye nobuchwepheshe beesekethe ezidibeneyo, ubunzima obuninzi besixhobo kunye nezakhiwo zeesekethe ziphakamise iimfuno zokuxilonga inkqubo ye-microelectronic chip, uhlalutyo lokungaphumeleli, kunye ne-micro / nano fabrication.Inkqubo yeDual Beam FIB-SEM, ngobuchule obunamandla bokuchaneka komatshini kunye nobuchule bokuhlalutya ngemicroscope, bube yimfuneko kuyilo lwe-microelectronic kunye nokuveliswa.
Inkqubo yeDual Beam FIB-SEMidibanisa zombini i-Focused Ion Beam (FIB) kunye ne-Scanning Electron Microscope (SEM). Ivumela ukubonwa kwe-SEM yexesha langempela kwiinkqubo ze-micromachining ezisekelwe kwi-FIB, ukudibanisa isisombululo esiphezulu se-spatial beam ye-electron kunye nobuchule obuchanekileyo bokucubungula izinto ze-ion beam.
Isiza-Specific Cross-Section Preparation
TISampuli ye-EM yoMfanekiso kunye noHlalutyo
SUkuchongwa okukhethiweyo okanye ukuHlolwa kwe-Etching eyongezelelweyo
Mi-etal kunye ne-Insulating Layer Deposition Testing